Etching System - SAMCO RIE-110ip
Description
The SAMCO RIE-110iP is an inductively coupled plasma etcher that provides both fluorine- and chlorine-based etch chemistries for anisotropic etching of semiconductor wafers.
It is primarily used for patterning silicon and III-V wafers for nanophotonic structures.
Download the SAMCO RIE-110iP Etching System Brochure (PDF version, 274 KB)
![Image of the SAMCO RIE-110iP etching system](/research-innovation/sites/g/files/bhrskd326/files/2022-04/Samco%20Etcher%20RIE%20110iP%20%284%29.jpg)